Liquid Level Control Valve for Wafer Polishing Slurry Tanks from China
Automatically maintains slurry levels in chemical mechanical polishing tanks for wafer surface preparation. HTS 8481.80.9015 for self-operating liquid level regulation in semiconductor wafer processing equipment. Ensures consistent polishing pressure and material removal rates.
Duty Rate — China → United States
39.5%
Rate breakdown
9903.88.0325%Except as provided in headings 9903.88.13, 9903.88.18, 9903.88.33, 9903.88.34, 9903.88.35, 9903.88.36, 9903.88.37, 9903.88.38, 9903.88.40, 9903.88.41, 9903.88.43, 9903.88.45, 9903.88.46, 9903.88.48, 9903.88.56, 9903.88.64, 9903.88.66, 9903.88.67, 9903.88.68, or 9903.88.69, articles the product of China, as provided for in U.S. note 20(e) to this subchapter and as provided for in the subheadings enumerated in U.S. note 20(f)
9903.05.3112.5%Section 301 (forced labor) — additional 12.5% ad valorem on products of China
Import Tips
• Document slurry composition compatibility (silica, ceria, etc.) for semiconductor CMP
• Specify self-operating float or diaphragm mechanism vs electronic level sensors