Flow Regulator Valve for Semiconductor Wafer Rinse Station from Japan
Self-operating valve precisely controls DI water flow rates in post-etch wafer rinse stations. Falls under HTS 8481.80.9015 as flow regulator for semiconductor cleaning processes. Maintains ultra-pure water flow critical for particle-free wafer surfaces.
Duty Rate — Japan → United States
12.5%
Rate breakdown
9903.05.4912.5%Section 301 (forced labor) — Japan (col1 rate < 12.5 percent): MFN < 12.5% → total duty capped at 12.5%
Import Tips
• Certify for 18+ megohm-cm DI water purity standards required in semiconductor fabs
• Distinguish from simple spray nozzles under 8424.90 provisions