Flow Regulator Valve for Semiconductor Wafer Rinse Station from Germany
Self-operating valve precisely controls DI water flow rates in post-etch wafer rinse stations. Falls under HTS 8481.80.9015 as flow regulator for semiconductor cleaning processes. Maintains ultra-pure water flow critical for particle-free wafer surfaces.
Duty Rate — Germany → United States
10%
Rate breakdown
9903.05.3910%Section 301 (forced labor) — European Union member state (col1 rate < 10 percent): MFN < 10% → total duty capped at 10%
Import Tips
• Certify for 18+ megohm-cm DI water purity standards required in semiconductor fabs
• Distinguish from simple spray nozzles under 8424.90 provisions