Flow Regulator Valve for Semiconductor Wafer Rinse Station from China
Self-operating valve precisely controls DI water flow rates in post-etch wafer rinse stations. Falls under HTS 8481.80.9015 as flow regulator for semiconductor cleaning processes. Maintains ultra-pure water flow critical for particle-free wafer surfaces.
Duty Rate — China → United States
39.5%
Rate breakdown
9903.88.0325%Except as provided in headings 9903.88.13, 9903.88.18, 9903.88.33, 9903.88.34, 9903.88.35, 9903.88.36, 9903.88.37, 9903.88.38, 9903.88.40, 9903.88.41, 9903.88.43, 9903.88.45, 9903.88.46, 9903.88.48, 9903.88.56, 9903.88.64, 9903.88.66, 9903.88.67, 9903.88.68, or 9903.88.69, articles the product of China, as provided for in U.S. note 20(e) to this subchapter and as provided for in the subheadings enumerated in U.S. note 20(f)
9903.05.3112.5%Section 301 (forced labor) — additional 12.5% ad valorem on products of China
Import Tips
• Certify for 18+ megohm-cm DI water purity standards required in semiconductor fabs
• Distinguish from simple spray nozzles under 8424.90 provisions