Flow Regulator Valve for Semiconductor Wafer Rinse Station from Canada
Self-operating valve precisely controls DI water flow rates in post-etch wafer rinse stations. Falls under HTS 8481.80.9015 as flow regulator for semiconductor cleaning processes. Maintains ultra-pure water flow critical for particle-free wafer surfaces.
Duty Rate — Canada → United States
12%
Rate breakdown
9903.05.2910%Except for products described in headings 9903.05.85–9903.05.93, articles the product of Canada, as provided for in U.S. note 52 to this subchapter
Import Tips
• Certify for 18+ megohm-cm DI water purity standards required in semiconductor fabs
• Distinguish from simple spray nozzles under 8424.90 provisions