Flow Regulator Valve for Semiconductor Wafer Rinse Station from Canada
Self-operating valve precisely controls DI water flow rates in post-etch wafer rinse stations. Falls under HTS 8481.80.9015 as flow regulator for semiconductor cleaning processes. Maintains ultra-pure water flow critical for particle-free wafer surfaces.
Duty Rate — Canada → United States
12%
Rate breakdown
9903.05.2910%Section 301 (forced labor) — additional 10% ad valorem on products of Canada
Import Tips
• Certify for 18+ megohm-cm DI water purity standards required in semiconductor fabs
• Distinguish from simple spray nozzles under 8424.90 provisions