High Purity Pneumatic Regulator for Wafer Cleaning Gas Lines from Japan
Pneumatic fluid power pressure regulator for nitrogen or argon gas lines in post-etch wafer cleaning stations within semiconductor fabs. Provides stepped pressure reduction from high tank pressures to delicate process requirements, classified under HTS 8481.10.00.60 as other pneumatic pressure-reducing valves.
Duty Rate — Japan → United States
12.5%
Rate breakdown
9903.05.4912.5%Section 301 (forced labor) — Japan (col1 rate < 12.5 percent): MFN < 12.5% → total duty capped at 12.5%
Import Tips
• Require electropolished 316L stainless steel construction with Ra < 10µin surface finish; provide helium leak test certificates; ensure compliance with SEMI S2 safety standards for semiconductor equipment