High Purity Pneumatic Regulator for Wafer Cleaning Gas Lines from China
Pneumatic fluid power pressure regulator for nitrogen or argon gas lines in post-etch wafer cleaning stations within semiconductor fabs. Provides stepped pressure reduction from high tank pressures to delicate process requirements, classified under HTS 8481.10.00.60 as other pneumatic pressure-reducing valves.
Duty Rate — China → United States
37%
Rate breakdown
9903.03.0110%Except for products described in headings 9903.03.02–9903.03.11, articles the product of any country, as provided for in subdivision (aa) of U.S. note 2 to this subchapter
9903.88.0125%Except as provided in headings 9903.88.05, 9903.88.06, 9903.88.07, 9903.88.08, 9903.88.10, 9903.88.11, 9903.88.14, 9903.88.19, 9903.88.50, 9903.88.52, 9903.88.58, 9903.88.60, 9903.88.62, 9903.88.66, 9903.88.67, 9903.88.68, or 9903.88.69, articles the product of China, as provided for in U.S. note 20(a) to this subchapter and as provided for in the subheadings enumerated in U.S. note 20(b) [to this subchapter]
Import Tips
• Require electropolished 316L stainless steel construction with Ra < 10µin surface finish; provide helium leak test certificates; ensure compliance with SEMI S2 safety standards for semiconductor equipment