EPSI Tri-Axial Cold Isostatic Press from Germany
EPSI's tri-axial cold isostatic press uses three-dimensional pressure application for producing large-diameter semiconductor ceramic tubes and rods from powders. It achieves 200-600 MPa hydrostatic compaction at room temperature, essential for consistent microstructures in GaAs device substrates. HTS 8479.83.00.00 covers this specialized isostatic compaction equipment.
Duty Rate — Germany → United States
10%
Rate breakdown
9903.05.3910%Except for products described in headings 9903.05.85–9903.05.92 and 9903.05.97, articles the product of a member state of the European Union, with an ad valorem (or ad valorem equivalent) rate of duty under column 1 less than 10 percent, as provided for in U.S. note 52 to this subchapter
Import Tips
• Provide engineering drawings showing tri-axial pressure chamber design for classification proof
• Certify for cleanroom compatibility if destined for semiconductor fabs; affects documentation