Wafer Grinding Coolant Agitator from Japan
Continuous stirring machine for coolant reservoirs in wafer grinders/lappers, preventing abrasive settling during backgrinding to achieve <1 micron flatness. HTS 8479.82.0040 for semiconductor wafer preparation equipment mixing per statistical note (a)(ii)(C). Maintains suspension for TTV control.
Duty Rate — Japan → United States
12.5%
Rate breakdown
9903.05.4912.5%Section 301 (forced labor) — Japan (col1 rate < 12.5 percent): MFN < 12.5% → total duty capped at 12.5%
Import Tips
• Specify coolant flow rates matching grinder specifications (5-20 GPM)
• Provide particle settling prevention test results for sub-micron abrasives