Single Wafer Polishing Tool from Japan
Advanced polisher that processes individual semiconductor wafers using chemical-mechanical planarization (CMP) to achieve mirror-like surface finish. Prepares wafers for photolithography and device formation. Classified HTS 8479.79.00.00 for specialized surface finishing machinery.
Duty Rate — Japan → United States
12.5%
Rate breakdown
9903.05.4912.5%Section 301 (forced labor) — Japan (col1 rate < 12.5 percent): MFN < 12.5% → total duty capped at 12.5%
Import Tips
• Detail CMP pad and slurry chemistry compatibility; ensure EPA compliance for waste
• Avoid classification as general CMP under 8460