Float Zone Crystal Grower from Germany
Equipment employing the float zone method to purify and grow monocrystalline semiconductor boules without a crucible, ideal for high-purity silicon and gallium arsenide. Used in initial stages of semiconductor material processing before wafer slicing. Falls under HTS 8479.79.00.00 as specialized machinery not elsewhere specified.
Duty Rate — Germany → United States
10%
Rate breakdown
9903.05.3910%Except for products described in headings 9903.05.85–9903.05.92 and 9903.05.97, articles the product of a member state of the European Union, with an ad valorem (or ad valorem equivalent) rate of duty under column 1 less than 10 percent, as provided for in U.S. note 52 to this subchapter
Import Tips
• Include process flow diagrams showing boule growth to justify HTS; ensure FCC compliance for RF components
• Avoid bulk classification with general furnaces