Float Zone Crystal Grower from Germany
Equipment employing the float zone method to purify and grow monocrystalline semiconductor boules without a crucible, ideal for high-purity silicon and gallium arsenide. Used in initial stages of semiconductor material processing before wafer slicing. Falls under HTS 8479.79.00.00 as specialized machinery not elsewhere specified.
Duty Rate — Germany → United States
10%
Rate breakdown
9903.05.3910%Section 301 (forced labor) — European Union member state (col1 rate < 10 percent): MFN < 10% → total duty capped at 10%
Import Tips
• Include process flow diagrams showing boule growth to justify HTS; ensure FCC compliance for RF components
• Avoid bulk classification with general furnaces