Chemical Mechanical Wafer Polisher from Canada
CMP tool integrating chemical slurry and mechanical polishing to planarize semiconductor wafers during device fabrication, removing oxide/metal layers uniformly. Includes endpoint detection systems. Under HTS 8479.79.00.00 as fabrication preparation equipment.
Duty Rate — Canada → United States
10%
Rate breakdown
9903.05.2910%Section 301 (forced labor) — additional 10% ad valorem on products of Canada
Import Tips
• Detail platen rotation and downforce control; slurry certification required
• Common error: classifying under general polishers