Wafer Polishing Pad Conditioner from Japan
Diamond disk conditioner that dresses CMP polishing pads to maintain uniform removal rates during semiconductor wafer polishing. HTS 8473.40.86.00 classification as accessory for heading 8472 wafer processing machines. Essential for consistent planarization performance.
Duty Rate — Japan → United States
12.5%
Rate breakdown
9903.05.4912.5%Except for products described in headings 9903.05.85–9903.05.92, articles the product of Japan, with an ad valorem (or ad valorem equivalent) rate of duty under column 1 less than 12.5 percent, as provided for in U.S. note 52 to this subchapter
Import Tips
• Include pad groove pattern specifications matching commercial CMP pads
• Prove kinematic compatibility with standard polishers
• Distinguish from general surface preparation tools