Wafer Lapping Machine from Japan
Machine using abrasive slurries to lap both sides of semiconductor wafers simultaneously, achieving critical flatness specifications. HTS 8473.40.86.00 covers this wafer preparation equipment for heading 8472 semiconductor machines. Prepares wafer surface before final polishing.
Duty Rate — Japan → United States
10%
Rate breakdown
9903.03.0110%Except for products described in headings 9903.03.02–9903.03.11, articles the product of any country, as provided for in subdivision (aa) of U.S. note 2 to this subchapter
Import Tips
• Document achievable flatness specs (e.g
• <1μm TTV) confirming semiconductor precision
• Include slurry handling system details in classification support
• Prevent reclassification as general surface grinding under 8460.29