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8473.40.86.00/Czochralski Crystal Puller Furnace/Japan

Czochralski Crystal Puller Furnace from Japan

A high-temperature furnace used to produce monocrystalline silicon boules via the Czochralski method for semiconductor wafer manufacturing. It is a key component classified under HTS 8473.40.86.00 as a part of semiconductor processing machines in heading 8472. This equipment precisely controls crystal growth conditions essential for semiconductor production.

Duty Rate — Japan → United States

12.5%

Rate breakdown

9903.05.4912.5%Section 301 (forced labor) — Japan (col1 rate < 12.5 percent): MFN < 12.5% → total duty capped at 12.5%
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Import Tips

• Verify equipment is solely for semiconductor machines under 8472 with technical specs and end-user certificates

• Include detailed process descriptions in entry docs to avoid misclassification as general lab apparatus

Czochralski Crystal Puller Furnace from Japan — Import Duty Rate | HTS 8473.40.86.00