Czochralski Crystal Puller Furnace from China
A high-temperature furnace used to produce monocrystalline silicon boules via the Czochralski method for semiconductor wafer manufacturing. It is a key component classified under HTS 8473.40.86.00 as a part of semiconductor processing machines in heading 8472. This equipment precisely controls crystal growth conditions essential for semiconductor production.
Duty Rate — China → United States
35%
Rate breakdown
9903.03.0110%Except for products described in headings 9903.03.02–9903.03.11, articles the product of any country, as provided for in subdivision (aa) of U.S. note 2 to this subchapter
9903.88.0125%Except as provided in headings 9903.88.05, 9903.88.06, 9903.88.07, 9903.88.08, 9903.88.10, 9903.88.11, 9903.88.14, 9903.88.19, 9903.88.50, 9903.88.52, 9903.88.58, 9903.88.60, 9903.88.62, 9903.88.66, 9903.88.67, 9903.88.68, or 9903.88.69, articles the product of China, as provided for in U.S. note 20(a) to this subchapter and as provided for in the subheadings enumerated in U.S. note 20(b) [to this subchapter]
Import Tips
• Verify equipment is solely for semiconductor machines under 8472 with technical specs and end-user certificates
• Include detailed process descriptions in entry docs to avoid misclassification as general lab apparatus