Wafer Lapping Machine Pressure Control Board from China

This PCA regulates pneumatic pressure systems in wafer lappers that achieve flatness tolerances for semiconductor wafer fabrication. It maintains nanometer-level uniformity across wafer surfaces. HTS 8473.30.11 as PCA for heading 8471 semiconductor processing equipment.

Duty Rate — China → United States

50%

Rate breakdown

9903.79.0125%Semiconductor articles as provided for in subdivisions (a) and (b) of U.S. note 39 to this subchapter
9903.88.0325%Except as provided in headings 9903.88.13, 9903.88.18, 9903.88.33, 9903.88.34, 9903.88.35, 9903.88.36, 9903.88.37, 9903.88.38, 9903.88.40, 9903.88.41, 9903.88.43, 9903.88.45, 9903.88.46, 9903.88.48, 9903.88.56, 9903.88.64, 9903.88.66, 9903.88.67, 9903.88.68, or 9903.88.69, articles the product of China, as provided for in U.S. note 20(e) to this subchapter and as provided for in the subheadings enumerated in U.S. note 20(f)
9903.03.030%Articles the product of any country, as provided for in subdivision (aa)(ii) of U.S. note 2 to this subchapter

Import Tips

Provide pressure regulation specifications (0.1 psi resolution) proving semiconductor tolerances

Include slurry flow integration documentation for chemical-mechanical processes

Certify materials compatibility with silicon carbide and diamond abrasives