Diamond Wafer Polishing Head Assembly from China
Carrier head assembly with diamond pad retention system for chemical mechanical polishing (CMP) of semiconductor wafers. This part for heading 8461 polishing machines is classified in HTS 8466.93.98.85 due to its semiconductor-specific design tolerances. Maintains uniform pressure across 300mm wafers during planarization.
Duty Rate — China → United States
39.7%
Rate breakdown
9903.03.0110%Except for products described in headings 9903.03.02–9903.03.11, articles the product of any country, as provided for in subdivision (aa) of U.S. note 2 to this subchapter
9903.88.0125%Except as provided in headings 9903.88.05, 9903.88.06, 9903.88.07, 9903.88.08, 9903.88.10, 9903.88.11, 9903.88.14, 9903.88.19, 9903.88.50, 9903.88.52, 9903.88.58, 9903.88.60, 9903.88.62, 9903.88.66, 9903.88.67, 9903.88.68, or 9903.88.69, articles the product of China, as provided for in U.S. note 20(a) to this subchapter and as provided for in the subheadings enumerated in U.S. note 20(b) [to this subchapter]
Import Tips
• Document diamond pad pressure uniformity (<1% variation); include slurry compatibility specifications; provide contamination-free material certifications