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Electrostatic Wafer Stage from Germany

Electrostatic stage that grips silicon wafers without physical contact during polishing or grinding in semiconductor equipment under headings 8464-8465. Classified as other work holder in HTS 8466.20.80.65 for principal use in wafer preparation like lapping and polishing. Prevents slip and contamination as noted in statistical definitions.

Duty Rate — Germany → United States

10%

Rate breakdown

9903.05.3910%Section 301 (forced labor) — European Union member state (col1 rate < 10 percent): MFN < 10% → total duty capped at 10%

Import Tips

Document voltage ratings and cleanroom certification; ensure declaration specifies semiconductor-only use; test for electrostatic discharge compliance with US standards

Electrostatic Wafer Stage from Germany — Import Duty Rate | HTS 8466.20.80.65