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High-Speed Wafer Polisher with In-Situ Cleaning from Canada

Rotary polishing machine for final mirror finish on semiconductor wafers, incorporating brush cleaning stations. HTS 8460.40.80.80 for polishing machines finishing cermet/semiconductor surfaces using polishing products. Achieves surface roughness <0.5nm for advanced nodes.

Duty Rate — Canada → United States

14.4%

Rate breakdown

9903.05.2910%Section 301 (forced labor) — additional 10% ad valorem on products of Canada

Import Tips

Specify polishing pad types, pressure controls, and achievable roughness values in technical specs

Document integration with fab cleanroom standards (ISO Class 1) to validate semiconductor use

High-Speed Wafer Polisher with In-Situ Cleaning from Canada — Import Duty Rate | HTS 8460.40.80.80