Semiconductor Wafer Polisher from Mexico
Chemical mechanical planarization (CMP) polisher for final semiconductor wafer surface preparation, achieving sub-nanometer roughness. Classified HTS 8448.20.50.90 as auxiliary for heading 8444 wafer fabrication preparation equipment.
Duty Rate — Mexico → United States
13.3%
Rate breakdown
9903.05.5510%Except for products described in headings 9903.05.85–9903.05.92 and 9903.05.94, articles the product of Mexico, as provided for in U.S. note 52 to this subchapter
Import Tips
• Specify polishing pad materials and slurry compatibility confirming semiconductor use
• Provide surface roughness specifications (Ra < 0.2nm) for classification
• Document cleanroom compatibility (Class 1) requirements