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Semiconductor Wafer Polisher from Mexico

Chemical mechanical planarization (CMP) polisher for final semiconductor wafer surface preparation, achieving sub-nanometer roughness. Classified HTS 8448.20.50.90 as auxiliary for heading 8444 wafer fabrication preparation equipment.

Duty Rate — Mexico → United States

13.3%

Rate breakdown

9903.05.5510%Section 301 (forced labor) — additional 10% ad valorem on products of Mexico

Import Tips

Specify polishing pad materials and slurry compatibility confirming semiconductor use

Provide surface roughness specifications (Ra < 0.2nm) for classification

Document cleanroom compatibility (Class 1) requirements

Semiconductor Wafer Polisher from Mexico — Import Duty Rate | HTS 8448.20.50.90