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Chemical Mechanical Wafer Polisher from Japan

CMP polisher planarizes semiconductor wafers using slurry for mirror-finish surfaces essential to printing processes in heading 8442 photolithography. Key ancillary machine in wafer prep sequence. Under 8443.91.10.00.

Duty Rate — Japan → United States

12.5%

Rate breakdown

9903.05.4912.5%Section 301 (forced labor) — Japan (col1 rate < 12.5 percent): MFN < 12.5% → total duty capped at 12.5%

Import Tips

Include slurry flow rate and pad pressure specs for classification support

Chemical safety data sheets mandatory

Chemical Mechanical Wafer Polisher from Japan — Import Duty Rate | HTS 8443.91.10.00