New Wafer Lapping Machine from Japan
Automated lapping equipment that uses abrasive slurries to flatten and thin semiconductor wafers to precise tolerances before polishing. Under HTS 8439.10.0010 as new wafer preparation machinery for cellulosic pulp processing in semiconductor statistical notes. Critical for achieving wafer flatness required in fabrication.
Duty Rate — Japan → United States
12.5%
Rate breakdown
9903.05.4912.5%Section 301 (forced labor) — Japan (col1 rate < 12.5 percent): MFN < 12.5% → total duty capped at 12.5%
Import Tips
• Include slurry compatibility certification for silicon/GaAs wafers
• Document as 'new' via factory test reports
• Common error: classifying under general lapping tools in 8460.42