New Wafer Lapping Machine from China
Automated lapping equipment that uses abrasive slurries to flatten and thin semiconductor wafers to precise tolerances before polishing. Under HTS 8439.10.0010 as new wafer preparation machinery for cellulosic pulp processing in semiconductor statistical notes. Critical for achieving wafer flatness required in fabrication.
Duty Rate — China → United States
37.5%
Rate breakdown
9903.88.0125%Except as provided in headings 9903.88.05, 9903.88.06, 9903.88.07, 9903.88.08, 9903.88.10, 9903.88.11, 9903.88.14, 9903.88.19, 9903.88.50, 9903.88.52, 9903.88.58, 9903.88.60, 9903.88.62, 9903.88.66, 9903.88.67, 9903.88.68, or 9903.88.69, articles the product of China, as provided for in U.S. note 20(a) to this subchapter and as provided for in the subheadings enumerated in U.S. note 20(b) [to this subchapter]
9903.05.3112.5%Section 301 (forced labor) — additional 12.5% ad valorem on products of China
Import Tips
• Include slurry compatibility certification for silicon/GaAs wafers
• Document as 'new' via factory test reports
• Common error: classifying under general lapping tools in 8460.42