New CMP Wafer Polisher from Germany
Chemical Mechanical Planarization (CMP) polisher for final surface finishing of semiconductor wafers, removing material uniformly to nanometer flatness. HTS 8439.10.0010 for new finishing machinery in semiconductor wafer prep per chapter notes. Uses polishing pads and slurries for device-ready surfaces.
Duty Rate — Germany → United States
10%
Rate breakdown
9903.05.3910%Except for products described in headings 9903.05.85–9903.05.92 and 9903.05.97, articles the product of a member state of the European Union, with an ad valorem (or ad valorem equivalent) rate of duty under column 1 less than 10 percent, as provided for in U.S. note 52 to this subchapter
Import Tips
• Demonstrate CMP-specific features like pad conditioning in technical files
• Affix 'new equipment' labels pre-shipment
• Pitfall: confusion with optical polishers in 8464