8422.40.91.81/Semiconductor Reticle Wrapping Station/Japan

Semiconductor Reticle Wrapping Station from Japan

Specialized station that wraps photomask reticles in nitrogen-purged, anti-static film for lithography transport. Under HTS 8422.40.91.81 as other wrapping machinery for delicate semiconductor optics. Maintains Class 1 cleanroom standards during operation.

Duty Rate — Japan → United States

12.5%

Rate breakdown

9903.05.4912.5%Section 301 (forced labor) — Japan (col1 rate < 12.5 percent): MFN < 12.5% → total duty capped at 12.5%

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Import Tips

• Include purge gas system certifications; document pellicle compatibility; provide vibration isolation specs for transport validation