Ion Implanter Cold Trap Assembly from Japan
Cryogenic cold trap for ion implanters that condenses and removes volatile contaminants from the vacuum beamline during high-dose semiconductor doping processes. Prevents wafer contamination. HTS 8418.99.8060 refrigerating part for semiconductor processing.
Duty Rate — Japan → United States
10%
Rate breakdown
9903.03.0110%Except for products described in headings 9903.03.02–9903.03.11, articles the product of any country, as provided for in subdivision (aa) of U.S. note 2 to this subchapter
Import Tips
• Include vacuum compatibility specs (UHV clean); certify for specific implanter models (Applied Materials, Varian)
• Pitfall: vacuum pump accessory classification