Epitaxial Reactor Temperature Control Unit from Japan
Refrigeration module for MOCVD epitaxial reactors that precisely controls wafer stage temperatures during thin film deposition of compound semiconductors like GaAs. Essential for uniform layer growth. Classified in HTS 8418.99.8060 per semiconductor processing provisions.
Duty Rate — Japan → United States
10%
Rate breakdown
9903.03.0110%Except for products described in headings 9903.03.02–9903.03.11, articles the product of any country, as provided for in subdivision (aa) of U.S. note 2 to this subchapter
Import Tips
• Certify compatibility with specific reactor models (e.g
• Aixtron, Veeco); include material safety data for refrigerants used
• Watch for reclassification as furnace parts