Cryogenic Compressor Housing for Low-Temperature Silicon Growth from Japan
Specialized housing rated for cryogenic temperatures in compressors supporting low-temperature epitaxial silicon growth for semiconductor wafers. Classifies under HTS 8414.90.41.65 for semiconductor crystal growth equipment.
Duty Rate — Japan → United States
25%
Rate breakdown
9903.82.0925%Except as provided for in headings 9903.82.16, 9903.82.20–9903.82.26 and 9903.85.68, articles of copper and derivative aluminum and steel articles, as provided for in subdivisions (c)(vi)–(viii) and (xi) of U.S. note 16 to this subchapter
9903.05.900%Articles already subject to Section 232 (steel/aluminum/copper + derivatives, autos + parts, wood, medium/heavy vehicles + parts, semiconductors, patented pharma) — U.S. note 52(f)
Import Tips
• Provide cryogenic test data (-100°C operation) and material expansion coefficients
• Link to specific epitaxial reactor models in end-use statements
• Distinguish from LNG cryocompressors (general industrial use)