8414.90.41.65/Cryogenic Compressor Housing for Low-Temperature Silicon Growth/Japan

Cryogenic Compressor Housing for Low-Temperature Silicon Growth from Japan

Specialized housing rated for cryogenic temperatures in compressors supporting low-temperature epitaxial silicon growth for semiconductor wafers. Classifies under HTS 8414.90.41.65 for semiconductor crystal growth equipment.

Duty Rate — Japan → United States

10%

Rate breakdown

9903.03.0110%Except for products described in headings 9903.03.02–9903.03.11, articles the product of any country, as provided for in subdivision (aa) of U.S. note 2 to this subchapter
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Import Tips

• Provide cryogenic test data (-100°C operation) and material expansion coefficients

• Link to specific epitaxial reactor models in end-use statements

• Distinguish from LNG cryocompressors (general industrial use)

Cryogenic Compressor Housing for Low-Temperature Silicon Growth from Japan — Import Duty Rate | HTS 8414.90.41.65