Wafer Lapping Vacuum Pump System from Mexico
Rotary vacuum pump >746 kW for wafer lapping machines that extracts lapping slurry to achieve precise flatness tolerances required for semiconductor fabrication. Addresses statistical note (a)(ii)(C) wafer preparation equipment. Classified under 8414.80.20.75 as high-power other vacuum pump for semiconductor processing.
Duty Rate — Mexico → United States
10%
Rate breakdown
9903.05.5510%Section 301 (forced labor) — additional 10% ad valorem on products of Mexico
Import Tips
• Reference statistical note (a)(ii)(C) in commercial invoice for lapping/polishing application
• Provide flatness tolerance specs (e.g
• <1 micron) demonstrating semiconductor precision requirements
• Avoid parts classification by importing as complete functional pump units