Float Zone Crystal Vacuum Pump from Japan
High-capacity rotary vacuum pump for float zone crystal growth systems exceeding 746 kW, used to process silicon into monocrystalline form for semiconductor wafers. Essential for maintaining zone melting under vacuum to achieve ultra-pure crystals free of impurities. Falls under 8414.80.20.75 as other vacuum pumps for semiconductor material growth over the power limit.
Duty Rate — Japan → United States
12.5%
Rate breakdown
9903.05.4912.5%Section 301 (forced labor) — Japan (col1 rate < 12.5 percent): MFN < 12.5% → total duty capped at 12.5%
Import Tips
• Submit float zone method process descriptions matching statistical note (a)(i) for proper semiconductor classification
• Certify vacuum levels and power consumption via test reports to confirm .75 subheading eligibility
• Avoid bulk packaging classification by documenting retail-ready semiconductor equipment status