Silicon Wafer Polisher Vacuum Centrifugal Pump from Japan
High-vacuum centrifugal pump evacuating chemical mechanical polishing (CMP) chambers to prevent contamination during final wafer surface preparation for device fabrication. HTS 8414.80.20.15 covers centrifugal pumps in wafer polishers per statistical wafer preparation provisions.
Duty Rate — Japan → United States
12.5%
Rate breakdown
9903.05.4912.5%Except for products described in headings 9903.05.85–9903.05.92, articles the product of Japan, with an ad valorem (or ad valorem equivalent) rate of duty under column 1 less than 12.5 percent, as provided for in U.S. note 52 to this subchapter
Import Tips
• Document CMP slurry chemical resistance; provide ultimate vacuum specs (e.g
• 10^-6 Torr); require semiconductor fab qualification certificates