Silicon Wafer Polisher Vacuum Centrifugal Pump from Germany
High-vacuum centrifugal pump evacuating chemical mechanical polishing (CMP) chambers to prevent contamination during final wafer surface preparation for device fabrication. HTS 8414.80.20.15 covers centrifugal pumps in wafer polishers per statistical wafer preparation provisions.
Duty Rate — Germany → United States
10%
Rate breakdown
9903.05.3910%Section 301 (forced labor) — European Union member state (col1 rate < 10 percent): MFN < 10% → total duty capped at 10%
Import Tips
• Document CMP slurry chemical resistance; provide ultimate vacuum specs (e.g
• 10^-6 Torr); require semiconductor fab qualification certificates