Semiconductor Wafer Cleaning Rinse Pump from Mexico
High-purity DI water pump for post-polish wafer rinsing stations in wafer prep lines. HTS 8413.81.0040 covers pumps for semiconductor wafer preparation equipment. Ensures particle-free surfaces before fabrication.
Duty Rate — Mexico → United States
25%
Rate breakdown
9903.82.0925%Except as provided for in headings 9903.82.16, 9903.82.20–9903.82.26 and 9903.85.68, articles of copper and derivative aluminum and steel articles, as provided for in subdivisions (c)(vi)–(viii) and (xi) of U.S. note 16 to this subchapter
9903.05.900%Articles already subject to Section 232 (steel/aluminum/copper + derivatives, autos + parts, wood, medium/heavy vehicles + parts, semiconductors, patented pharma) — U.S. note 52(f)
Import Tips
• Document ultrapure water specs (18MOhm); comply with semiconductor cleanroom standards
• Avoid general plumbing pump declarations