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Epitaxial Reactor Rotation Motor from Japan

High-temperature motor rotating substrates during epitaxial layer deposition for semiconductor devices. Part of reactor engines under HTS 8412.90.90.

Duty Rate — Japan → United States

12.5%

Rate breakdown

9903.05.4912.5%Section 301 (forced labor) — Japan (col1 rate < 12.5 percent): MFN < 12.5% → total duty capped at 12.5%

Import Tips

Document operating temperature (>400°C); include gas flow compatibility specs; distinguish from CVD equipment parts