Ion Implanter Turbine Drive from Japan
High-precision gas turbine powering end-station rotation in ion implanters for semiconductor wafer doping. Under 8411.99.9085 for non-aircraft gas turbine parts in semiconductor device processing.
Duty Rate — Japan → United States
12.5%
Rate breakdown
9903.05.4912.5%Section 301 (forced labor) — Japan (col1 rate < 12.5 percent): MFN < 12.5% → total duty capped at 12.5%
Import Tips
• Document dose uniformity specifications; include high-voltage safety certifications; verify radioactive source exemptions if applicable