Germanium Sputtering Target Blank from Japan

Cylindrical unwrought germanium blanks prepared for machining into sputtering targets for PVD coating systems. HTS 8112.92.65.00 covers this as other unwrought form before final shaping. Critical for depositing thin germanium films in microelectronics.

Duty Rate — Japan → United States

4.4%

Rate breakdown

9903.03.030%Articles the product of any country, as provided for in subdivision (aa)(ii) of U.S. note 2 to this subchapter

Import Tips

Label as 'blanks for further manufacture' to avoid article classification

Provide sputtering end-use affidavits