Indium Scrap from Semiconductor Etching from China
Waste and scrap indium recovered from ITO sputtering target etching processes in semiconductor fabrication. HTS 8112.92.30.00 covers such scrap as long as it's predominantly unwrought indium.
Duty Rate — China → United States
25%
Rate breakdown
9903.91.0125%Effective with respect to entries on or after September 27, 2024, articles the product of China, as provided for in subdivision (b) of U.S. note 31 to this subchapter
9903.05.860%Articles provided for in subdivision (b) of U.S. note 52 to this subchapter
Import Tips
• Provide recycling certificate and assay report showing >50% indium content for scrap valuation
• Comply with Basel Convention for transboundary hazardous waste movements
• Document origin to avoid anti-dumping duties if from certain countries