Indium Tin Oxide Sputtering Target Scrap from Japan
Used indium-containing sputtering targets from display panel manufacturing, processed as metallic scrap. HTS 8112.92.07.00 includes indium waste from electronics thin-film deposition.
Duty Rate — Japan → United States
12.5%
Rate breakdown
9903.05.4912.5%Section 301 (forced labor) — Japan (col1 rate < 12.5 percent): MFN < 12.5% → total duty capped at 12.5%
Import Tips
• Disclose tin alloy content; if tin > indium, may reclassify under Chapter 80
• Clean targets of coatings to qualify as metallic scrap vs. coated articles
• File EEI for strategic metal imports regardless of value threshold