Rhenium Sputtering Target from Mexico

A high-purity disc or rectangular plate of rhenium used in physical vapor deposition for thin-film coating in electronics manufacturing. Classified under HTS 8112.49.00.00 as an article of rhenium, distinct from unwrought forms. Its purity exceeds 99% rhenium content, meeting chapter definitions for base metals.

Duty Rate — Mexico → United States

4%

Rate breakdown

9903.03.030%Articles the product of any country, as provided for in subdivision (aa)(ii) of U.S. note 2 to this subchapter

Import Tips

Verify rhenium purity via assay certificates to avoid misclassification as alloys under Chapter 81 notes

Include end-use statements for manufacturing to comply with export controls on high-tech materials

Watch for dual-use restrictions; declare if for semiconductor or aerospace applications

Rhenium Sputtering Target from Mexico — Import Duty Rate | HTS 8112.49.00.00