Rhenium Sputtering Target from Japan
A high-purity disc or rectangular plate of rhenium used in physical vapor deposition for thin-film coating in electronics manufacturing. Classified under HTS 8112.49.00.00 as an article of rhenium, distinct from unwrought forms. Its purity exceeds 99% rhenium content, meeting chapter definitions for base metals.
Duty Rate — Japan → United States
4%
Rate breakdown
9903.05.860%Articles provided for in subdivision (b) of U.S. note 52 to this subchapter
Import Tips
• Verify rhenium purity via assay certificates to avoid misclassification as alloys under Chapter 81 notes
• Include end-use statements for manufacturing to comply with export controls on high-tech materials
• Watch for dual-use restrictions; declare if for semiconductor or aerospace applications