Rhenium Sputtering Target from China
A high-purity disc or rectangular plate of rhenium used in physical vapor deposition for thin-film coating in electronics manufacturing. Classified under HTS 8112.49.00.00 as an article of rhenium, distinct from unwrought forms. Its purity exceeds 99% rhenium content, meeting chapter definitions for base metals.
Duty Rate — China → United States
29%
Rate breakdown
9903.88.0325%Except as provided in headings 9903.88.13, 9903.88.18, 9903.88.33, 9903.88.34, 9903.88.35, 9903.88.36, 9903.88.37, 9903.88.38, 9903.88.40, 9903.88.41, 9903.88.43, 9903.88.45, 9903.88.46, 9903.88.48, 9903.88.56, 9903.88.64, 9903.88.66, 9903.88.67, 9903.88.68, or 9903.88.69, articles the product of China, as provided for in U.S. note 20(e) to this subchapter and as provided for in the subheadings enumerated in U.S. note 20(f)
9903.03.030%Articles the product of any country, as provided for in subdivision (aa)(ii) of U.S. note 2 to this subchapter
Import Tips
• Verify rhenium purity via assay certificates to avoid misclassification as alloys under Chapter 81 notes
• Include end-use statements for manufacturing to comply with export controls on high-tech materials
• Watch for dual-use restrictions; declare if for semiconductor or aerospace applications