High-Purity Rhenium Sputtering Target Powder from China
Rhenium powder specifically prepared for plasma sputtering to deposit thin films in semiconductors. Classified as unwrought powder under HTS 8112.41.50.00 since not formed into sputtering targets yet. Critical for microelectronics manufacturing.
Duty Rate — China → United States
28%
Rate breakdown
9903.88.0325%Except as provided in headings 9903.88.13, 9903.88.18, 9903.88.33, 9903.88.34, 9903.88.35, 9903.88.36, 9903.88.37, 9903.88.38, 9903.88.40, 9903.88.41, 9903.88.43, 9903.88.45, 9903.88.46, 9903.88.48, 9903.88.56, 9903.88.64, 9903.88.66, 9903.88.67, 9903.88.68, or 9903.88.69, articles the product of China, as provided for in U.S. note 20(e) to this subchapter and as provided for in the subheadings enumerated in U.S. note 20(f)
9903.03.030%Articles the product of any country, as provided for in subdivision (aa)(ii) of U.S. note 2 to this subchapter
Import Tips
• Include supplier specs confirming no binders/additives to maintain unwrought status
• Declare vacuum-sealed packaging to prevent auto-oxidation claims at entry
• Watch for ITAR restrictions; provide civilian end-use certification