Manganese Target Plates for Sputtering from China
Polished manganese plates used as sputtering targets in thin-film deposition for semiconductors. Falls under HTS 8111.00.60.00 as 'other' manganese articles, specifically fabricated for vacuum coating processes. Meets base metal purity standards.
Duty Rate — China → United States
16.2%
Rate breakdown
9903.05.3112.5%Section 301 (forced labor) — additional 12.5% ad valorem on products of China
Import Tips
• Include sputtering process specs to justify article classification
• Test for surface purity; contamination risks alloy status under Chapter 81
• Comply with export controls for semiconductor materials