Quartz LPCVD Reactor Tube from Japan
Specialized fused quartz tube for Low Pressure Chemical Vapor Deposition (LPCVD) reactors in semiconductor thin film deposition. Maintains vacuum integrity at elevated temperatures. Classifies under HTS 7020.00.30.00 for diffusion/oxidation furnace insertion.
Duty Rate — Japan → United States
12.5%
Rate breakdown
9903.05.4912.5%Section 301 (forced labor) — Japan (col1 rate < 12.5 percent): MFN < 12.5% → total duty capped at 12.5%
Import Tips
• Document vacuum flange compatibility (KF/VCR) proving reactor tube function
• Specify deposition precursors (TEOS, silane) for process validation
• Avoid 'general furnace tube' declarations; emphasize semiconductor specificity