Quartz LPCVD Reactor Tube from China
Specialized fused quartz tube for Low Pressure Chemical Vapor Deposition (LPCVD) reactors in semiconductor thin film deposition. Maintains vacuum integrity at elevated temperatures. Classifies under HTS 7020.00.30.00 for diffusion/oxidation furnace insertion.
Duty Rate — China → United States
37.5%
Rate breakdown
9903.05.3112.5%Except for products described in headings 9903.05.85–9903.05.92, articles the product of China, as provided for in U.S. note 52 to this subchapter
9903.88.0325%Except as provided in headings 9903.88.13, 9903.88.18, 9903.88.33, 9903.88.34, 9903.88.35, 9903.88.36, 9903.88.37, 9903.88.38, 9903.88.40, 9903.88.41, 9903.88.43, 9903.88.45, 9903.88.46, 9903.88.48, 9903.88.56, 9903.88.64, 9903.88.66, 9903.88.67, 9903.88.68, or 9903.88.69, articles the product of China, as provided for in U.S. note 20(e) to this subchapter and as provided for in the subheadings enumerated in U.S. note 20(f)
Import Tips
• Document vacuum flange compatibility (KF/VCR) proving reactor tube function
• Specify deposition precursors (TEOS, silane) for process validation
• Avoid 'general furnace tube' declarations; emphasize semiconductor specificity