Horizontal Diffusion Furnace Tube from Japan
Long fused quartz tube for horizontal diffusion furnaces used in semiconductor dopant diffusion processes. Engineered for gas flow dynamics and 1200°C+ operation. Precisely matches HTS 7020.00.30.00 description for semiconductor wafer production equipment.
Duty Rate — Japan → United States
12.5%
Rate breakdown
9903.05.4912.5%Section 301 (forced labor) — Japan (col1 rate < 12.5 percent): MFN < 12.5% → total duty capped at 12.5%
Import Tips
• Specify horizontal furnace compatibility vs. vertical to avoid labware confusion
• Include end-flange specifications matching industry furnace standards
• Certify for POCL3, PH3 process compatibility; common CBP inquiry