Horizontal Diffusion Furnace Tube from Canada
Long fused quartz tube for horizontal diffusion furnaces used in semiconductor dopant diffusion processes. Engineered for gas flow dynamics and 1200°C+ operation. Precisely matches HTS 7020.00.30.00 description for semiconductor wafer production equipment.
Duty Rate — Canada → United States
10%
Rate breakdown
9903.05.2910%Except for products described in headings 9903.05.85–9903.05.93, articles the product of Canada, as provided for in U.S. note 52 to this subchapter
Import Tips
• Specify horizontal furnace compatibility vs. vertical to avoid labware confusion
• Include end-flange specifications matching industry furnace standards
• Certify for POCL3, PH3 process compatibility; common CBP inquiry