PFC Plasma Cleaning Gas Mixture from Mexico
Perfluorocarbon blend for plasma chamber cleaning in semiconductor fabrication facilities. HTS 3827.59.00.00 for CFC/HCFC-free PFC mixtures. Removes polymer residues without damaging chamber components.
Duty Rate — Mexico → United States
13.7%
Rate breakdown
9903.05.5510%Except for products described in headings 9903.05.85–9903.05.92 and 9903.05.94, articles the product of Mexico, as provided for in U.S. note 52 to this subchapter
Import Tips
• Purity >99.999% ('5N') certification required; include SEMI standard compliance; DOT UN3373 special provisions