PFC Plasma Cleaning Gas Mixture from Mexico
Perfluorocarbon blend for plasma chamber cleaning in semiconductor fabrication facilities. HTS 3827.59.00.00 for CFC/HCFC-free PFC mixtures. Removes polymer residues without damaging chamber components.
Duty Rate — Mexico → United States
13.7%
Rate breakdown
9903.05.5510%Section 301 (forced labor) — additional 10% ad valorem on products of Mexico
Import Tips
• Purity >99.999% ('5N') certification required; include SEMI standard compliance; DOT UN3373 special provisions