3827.59.00.00/PFC Plasma Cleaning Gas Mixture/Japan

PFC Plasma Cleaning Gas Mixture from Japan

Perfluorocarbon blend for plasma chamber cleaning in semiconductor fabrication facilities. HTS 3827.59.00.00 for CFC/HCFC-free PFC mixtures. Removes polymer residues without damaging chamber components.

Duty Rate — Japan → United States

12.5%

Rate breakdown

9903.05.4912.5%Section 301 (forced labor) — Japan (col1 rate < 12.5 percent): MFN < 12.5% → total duty capped at 12.5%

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Import Tips

• Purity >99.999% ('5N') certification required; include SEMI standard compliance; DOT UN3373 special provisions